Magnetronska sputter PVD napravaCemeCon
CC 800/9 HIPIMS
Magnetronska sputter PVD naprava
CemeCon
CC 800/9 HIPIMS
Leto izdelave
2006
Stanje
Rabljeno
Lokacija
Bremen 

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Podatki o stroju
- Opis stroja:
- Magnetronska sputter PVD naprava
- Proizvajalec:
- CemeCon
- Model:
- CC 800/9 HIPIMS
- Serijska številka:
- 11176
- Leto izdelave:
- 2006
- Stanje:
- rabljeno
- Funkcionalnost:
- popolnoma funkcionalen
Cena in lokacija
- Lokacija:
- Bremen, Nemčija

Klic
Podrobnosti ponudbe
- ID ponudbe:
- A20922332
- Št. reference:
- HIPIMS
- Nazadnje posodobljeno:
- dne 13.01.2026
Opis
We offer this used CemeCon CC 800/9 HIPIMS magnetron sputter PVD system, year of manufacture 2006.
Manufacturer: CemeCon
Model: CC 800/9
Serial number: 11176
Year of manufacture: 2006, upgraded in 2013 and 2025
Weight: 3000 kg
Protection class: IP 20
Power: 166 kVA
Evaporators: 6
Voltage: 3×400/N/PE V
Frequency: 50/60 Hz
CemeCon CC800/9 HIPIMS
- 6 cathodes
- All cathodes DC, with 2 HIPIMS
- Booster anodes
Gtsdex Tt T Repfx Afqst
- 4 gases, 1 flammable
- Bias: DC, MF-pulsed, or HIPIMS
- 3x heating system
- 2 turbopumps
- 6-position substrate table
- Multiple targets
- incl. option for BNC extraction of Peak I, U, and P at HIPIMS cathodes + BIAS
- Extensive accessories such as loading materials, spare parts, and consumables
- 07/2023: system control upgraded to latest standard and serviced by manufacturer.
A package deal including a chiller unit, precision substrate cleaning system, and lapping/polishing machine is also available.
If you have any questions or require further information, please send us a message or call us.
Oglas je bil preveden samodejno, zaradi česar je morda prišlo do napak pri prevodu.
Manufacturer: CemeCon
Model: CC 800/9
Serial number: 11176
Year of manufacture: 2006, upgraded in 2013 and 2025
Weight: 3000 kg
Protection class: IP 20
Power: 166 kVA
Evaporators: 6
Voltage: 3×400/N/PE V
Frequency: 50/60 Hz
CemeCon CC800/9 HIPIMS
- 6 cathodes
- All cathodes DC, with 2 HIPIMS
- Booster anodes
Gtsdex Tt T Repfx Afqst
- 4 gases, 1 flammable
- Bias: DC, MF-pulsed, or HIPIMS
- 3x heating system
- 2 turbopumps
- 6-position substrate table
- Multiple targets
- incl. option for BNC extraction of Peak I, U, and P at HIPIMS cathodes + BIAS
- Extensive accessories such as loading materials, spare parts, and consumables
- 07/2023: system control upgraded to latest standard and serviced by manufacturer.
A package deal including a chiller unit, precision substrate cleaning system, and lapping/polishing machine is also available.
If you have any questions or require further information, please send us a message or call us.
Oglas je bil preveden samodejno, zaradi česar je morda prišlo do napak pri prevodu.
Ponudnik
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